Reviewed

Inductively Coupled Plasma (ICP) and Open-Load Reactive Ion Etchers

Waiver type - Procurement: Nonavailability

Agency: NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (1341) • Product Service Code (PSC) : 6640 | Last Modified: 09/06/2023

Procurement Summary

The National Institute of Standards and Technology (NIST), Physical Measurements Laboratory, Physical Measurement Laboratory Division, Center for Nanoscale Science and Technology (CNST), requires three systems to etch semiconductor substrates and thin films as follows: System 1: Metal Silicon Inductively Coupled Plasma (ICP) Etcher; System 2: Cryo Silicon ICP Etcher; System 3: Open-load Reactive Ion Etcher

Waiver Rationale Summary

No domestic manufacturer has been identified that can provide the equipment that satisfies requirements of the NIST Physical Measurements Laboratory (PML). The required Metal Silicon ICP Etcher; Cryo Silicon ICP Etcher; and Open-load Reactive Ion Etcher are not mined, produced, or manufactured in the United States in sufficient and reasonably available commercial quantities of satisfactory quality that will meet the program office requirement.

Did / Will the solicitation include one of the standard BAA provisions announcing the agency’s intention to provide a price preference for domestic end products and construction material?

Yes

Was a sources sought or Request for Information issued?

Yes

OMB Determination

Consistent with Policy

Product

LABORATORY EQUIPMENT AND SUPPLIES

NAICS

333242 - Semiconductor Machinery Manufacturing

Date Submitted

08/16/2023

Procurement Instrument Identifier (PIID)

1333ND23PNB680419

Solicitation ID

1333ND23QNB680183

Procurement Stage

Post-solicitation

Expected Maximum Duration of the Proposed Waiver

Instant Delivery Only

Waiver Coverage

Individual Waiver

Funding Agency

NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY